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Products Optical Instruments Optics / Physics Educ Kits Opto-mechanics Light Sources Experimental Instruments Photonics Components Flat-top Beam Shaper Technologies Technology Summary Downloads Product Catalog LEOK-3 Manual	Optical Instruments » Thin Film Thickness Measurement System Introduction Based on interference spectral analysis of multi- reflection beams, this instrument functions non-contact optical measurement of thickness, refractive index, and absorption index of various optical thin films and coatings. Applications Dielectric coatings on optical components, coated optical filters, semiconductor fabrication on wafers, liquid crystal devices. Example thin film layer: SiO2, CaF2, MgF2, Photoresist, Polysilicon, Amorphous Silicon, SiNx, TiO2, Sol-Gel, Polyimide, Polymer Film. Example substrate material: Silicon, Germanium, GaAs, ZnS, ZnSe, Acrylic, Sapphire, Glasses, Polycarbonate, Polymer, Quartz.   Thin Film Panel Specifications Measurement Range   20 nm to 50 µm (Thickness only), 100 nm to 10 µm (Thickness w/ n & k) Measurable Layers   Up to 4 layers Spot Size (normal)   Adjustable 0.8 mm to 1 cm Spot Size (Microscope)   minimum 5 micron Sample Size   From 1 mm and up Thickness Accuracy   the greater of ± 1 nm or ±0.5% Precision   0.2 nm Repeatability   0.1 nm Stage Size   200 mm x 200 mm Thin Film Thickness Measurement System One Thin Film Measurement main machine (110V-240V AC), Including a Tungsten Halogen light source and a PC based optical mini spectrometer with USB interface. Beam transfer, projection, and receiving fiber cables and optical assemblies New Span Thin Film Measurement Software One Silicon wafer as reflectance standard One fiber adapter with inner C-mount thread for microscope connection. Supporting hardware PC requirement: >800 MHz clock, RAM 128 M, Windows NT, 2000 or XP. Separate Use of the Contained Light Source or Spectrometer The main machine includes one Tungsten Halogen light source (360-2500 nm) and one PC-based USB mini spectrometer (350-1000 nm), each features an SMA 905 Connector. By disconnecting the optical fibers of the optical head of the main machine, they can be coupled through optical fibers for other illumination or spectroscopic measurement applications. Measurement Features Substrate refractive index and absorption index evaluation Film thickness measurement, mean and standard deviation Film material refractive index and absorption index evaluation Saving of measured spectral dependent reflectance data Data loading of previously saved reflectance data Statistics of measurement results User friendly cursor controlled display of measured results Flexible choice of computation wavelength range Flexible choice of guess thickness range to minimize computation time Convenient selection of film and substrate materials from included database User defined materials selection and import. TF-166 connected to a microscope for micro area thin film measurement.
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